Accurate EUV lithography simulation enabled by calibrated physical resist models

Allow download: 
Allow download

Resource:

http://www.electroiq.com/index/display/semiconductors-article-display/2744719178/articles/solid-state-technology/semiconductors/lithography/2010/september/accurate-euv_lithography.html
09/23/2010 - 3:38pm
# of views: 2555

©2010 MCA

2119 Landings Drive | Mountain View, Calif. 94043

Tel +1.650.968.8900 | Fax +1.650.968.8990 | [email protected]
Source URL: https://www.engagez.net/posting/90867