AccuThermo AW 810 Key Features:

• Heating chamber’s cold-wall design with gold plating finish which has been approved in 30 years  (►).
• Atmospheric Rapid Thermal Annealing system with Top and bottom IR lamp heating for superior heating uniformity (►).
• Closed-loop temperature control with pyrometer (No-Contact) or thermocouple temperature sensing (►).
• Precise time-temperature profiles tailored to suit specific process requirements (►).
• Fast heating and cooling rates unobtainable with conventional technologies.
• Consistent wafer-to-wafer process cycle repeatability which is the most important characteristic of rapid thermal annealing systems.
• Elimination of external contamination with isolated quartz tube.
• Small footprint and energy efficiency.
• Software which integrates all of the Process Control into a single reliable software package (►).
  • GUI interface (►).
  • Real-Time process data acquisition (►).
  • Real-Time graphics (►).
  • Process Data Analysis  (►).
  • Process Data and Recipe storage on a hard drive (►).
  • Recipe Editor for Multi-step Processing (►).
  • Easy Recipe Editor (►).
  • System Diagnostics function (►).
  • Chamber calibration data for smooth control (►).
  • Easy software pyrometer calibration (►)
  • Easy software gas calibration (►)
  • Easy software thermocouple calibration (►)
  • Power summary function for better performance repeatability control (►).
  • More IO AD DA hardware exposed for easier maintenance and trouble shooting (►)
  • The watchdog timer shuts down the lamps to prevent run-away heating of the wafer.

Applications

The AccuThermo RTP system is a versatile tool that is useful for many applications:

• Ion Implant Activation
• Polysilicon Annealing
• Oxide Reflow
• Silicide Formation
• Contact Alloying
• Oxidation and Nitridation
• GaAs Processing

Rapid Thermal Process, Rapid Thermal Processing, Rapid Thermal Anneal, Rapid Thermal Annealing, Rapid Thermal Oxidation, Rapid Thermal Nitride, RTA, RTP, RTO, RTN,, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associates, Heatpulse 210, Heatpulse 410, Minipulse 310, Heatpulse 610, Heatpulse 610I, AG Heatpulse 410, AG Heatpulse 610, AG Heatpulse 210, AG Minipulse 310, Atmospheric Rapid Thermal Process, Vacuum Rapid Thermal Process, Furnace, Oven, Thermal Furnace, Thermal Process, Thermal Processing, Heatpulse 4100, Heatpulse 4108, Heatpulse 8108, Heatpulse 8800,